data:post.title TSMC's Roadmap at a Glance: N3X, N2P, A16 Coming in 2025/2026 <p align="center"><a href="https://www.anandtech.com/show/21408/tsmc-roadmap-at-a-glance-n3x-n2p-a16-2025-2026"><img src="https://images.anandtech.com/doci/21408/tsmc-wafer-semiconductor-chip-fab-678_575px.jpg" alt="" /></a></p><p><p>As announced last week by TSMC, later this year the company is set to start high-volume manufacturing on its N3P fabrication process, and this will be the company&#39;s most advanced node for a while. Next year things will get a bit more interesting as TSMC will have two process technologies that could actually compete against each other when they enter high-volume manufacturing (HVM) in the second half of 2025.</p> <table align="center" border="0" cellpadding="0" cellspacing="1" style="background-color: rgb(246, 246, 246);" width="680"> <tbody> <tr class="tgrey"> <td align="center" colspan="10">Advertised PPA Improvements of New Process Technologies<br /> <small>Data announced during conference calls, events, press briefings and press releases</small></td> </tr> <tr class="tlblue"> <td rowspan="2" width="186">Compiled<br /> by<br /> AnandTech</td> <td align="center" colspan="8" width="137">TSMC</td> </tr> <tr class="tlblue"> <td align="center" valign="middle" width="136">N3<br /> vs<br /> N5</td> <td align="center" valign="middle" width="136">N3E<br /> vs<br /> N5</td> <td align="center" valign="middle" width="136">N3P<br /> vs<br /> N3E</td> <td align="center" valign="middle" width="136">N3X<br /> vs<br /> N3P</td> <td align="center" valign="middle" width="136">N2<br /> vs<br /> N3E</td> <td align="center" valign="middle" width="136">N2P<br /> vs<br /> N3E</td> <td align="center" valign="middle" width="136">N2P<br /> vs<br /> N2</td> <td align="center" valign="middle" width="136">A16<br /> vs<br /> N2P</td> </tr> <tr> <td class="tlgrey">Power</td> <td align="center" valign="middle">-25%<br /> -30%</td> <td align="center" valign="middle">-34%</td> <td align="center" valign="middle">-5%<br /> -10%</td> <td align="center" valign="middle">-7%***</td> <td align="center" valign="middle"><span style="caret-color: rgb(68, 68, 68); color: rgb(68, 68, 68); text-align: -webkit-center; background-color: rgb(238, 238, 238);">-25%<br /> -30%</span></td> <td align="center" valign="middle">-30%<br /> -40%</td> <td align="center" valign="middle">-5%<br /> -10%</td> <td align="center" valign="middle">-15%<br /> -20%</td> </tr> <tr> <td class="tlgrey">Performance</td> <td align="center" valign="middle">+10%<br /> +15%</td> <td align="center" valign="middle">+18%</td> <td align="center" valign="middle">+5%</td> <td align="center" valign="middle">+5%<br /> Fmax @1.2V**</td> <td align="center" valign="middle">+10%<br /> +15%</td> <td align="center" valign="middle">+15%<br /> +20%</td> <td align="center" valign="middle">+5<br /> +10%</td> <td align="center" valign="middle">+8%<br /> +10%</td> </tr> <tr> <td class="tlgrey">Density*</td> <td align="center" valign="middle">?</td> <td align="center" valign="middle">1.3x</td> <td align="center" valign="middle">1.04x</td> <td align="center" valign="middle">1.10x***</td> <td align="center" valign="middle">1.15x</td> <td align="center" valign="middle">1.15x</td> <td align="center" valign="middle">?</td> <td align="center" valign="middle">1.07x<br /> 1.10x</td> </tr> <tr> <td class="tlgrey">HVM</td> <td align="center" valign="middle">Q4<br /> 2022</td> <td align="center" valign="middle">Q4<br /> 2023</td> <td align="center" valign="middle">H2<br /> 2024</td> <td align="center" valign="middle">H2<br /> 2025</td> <td align="center" valign="middle">H2<br /> 2025</td> <td align="center" valign="middle">H2<br /> 2026</td> <td align="center" valign="middle">H2<br /> 2026</td> <td align="center" valign="middle">H2<br /> 2026</td> </tr> </tbody> </table> <p><small>*Chip density published by TSMC reflects &#39;mixed&#39; chip density consisting of 50% logic, 30% SRAM, and 20% analog.<br /> **At the same area.&nbsp;<br /> ***At the same speed.</small></p> <p>The production nodes are N3X (3nm-class, extreme performance-focused) as well as N2 (2nm-class). TSMC says that when compared to N3P, chips made on N3X can either lower power consumption by 7% at the same frequency by lowering Vdd from 1.0V to 0.9V, increase performance by 5% at the same area, or increase transistor density by around 10% at the same frequency. Meanwhile, the key advantage of N3X compared to predecessors is its maximum voltage of 1.2V, which is important for ultra-high-performance applications, such as desktop or datacenter GPUs.</p> <p>TSMC&#39;s N2 will be TSMC&#39;s first production node to use gate-all-around (GAA) nanosheet transistors and this will significantly enhance its performance, power, and are... Semiconductors

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TSMC's Roadmap at a Glance: N3X, N2P, A16 Coming in 2025/2026

As announced last week by TSMC, later this year the company is set to start high-volume manufacturing on its N3P fabrication process, and this will be the company's most advanced node for a while. Next year things will get a bit more interesting as TSMC will have two process technologies that could actually compete against each other when they enter high-volume manufacturing (HVM) in the second half of 2025.

Advertised PPA Improvements of New Process Technologies
Data announced during conference calls, events, press briefings and press releases
Compiled
by
AnandTech
TSMC
N3
vs
N5
N3E
vs
N5
N3P
vs
N3E
N3X
vs
N3P
N2
vs
N3E
N2P
vs
N3E
N2P
vs
N2
A16
vs
N2P
Power -25%
-30%
-34% -5%
-10%
-7%*** -25%
-30%
-30%
-40%
-5%
-10%
-15%
-20%
Performance +10%
+15%
+18% +5% +5%
Fmax @1.2V**
+10%
+15%
+15%
+20%
+5
+10%
+8%
+10%
Density* ? 1.3x 1.04x 1.10x*** 1.15x 1.15x ? 1.07x
1.10x
HVM Q4
2022
Q4
2023
H2
2024
H2
2025
H2
2025
H2
2026
H2
2026
H2
2026

*Chip density published by TSMC reflects 'mixed' chip density consisting of 50% logic, 30% SRAM, and 20% analog.
**At the same area. 
***At the same speed.

The production nodes are N3X (3nm-class, extreme performance-focused) as well as N2 (2nm-class). TSMC says that when compared to N3P, chips made on N3X can either lower power consumption by 7% at the same frequency by lowering Vdd from 1.0V to 0.9V, increase performance by 5% at the same area, or increase transistor density by around 10% at the same frequency. Meanwhile, the key advantage of N3X compared to predecessors is its maximum voltage of 1.2V, which is important for ultra-high-performance applications, such as desktop or datacenter GPUs.

TSMC's N2 will be TSMC's first production node to use gate-all-around (GAA) nanosheet transistors and this will significantly enhance its performance, power, and are... Semiconductors

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